Low surface damage dry etched black silicon
نویسندگان
چکیده
منابع مشابه
Damage studies in dry etched textured silicon surfaces
Surface texturing is a more permanent and effective solution to eliminate reflections compared with antireflection coatings in optical devices. In this study texturing was performed using a reactive ion etching technique, reflectance was measured and the resultant damage on the surfaces was monitored through the minority carrier lifetime measurements. High minority carrier lifetime is an indica...
متن کاملSurface passivation of black silicon phosphorus emitters
ii Abstract (in Finnish) iiiin Finnish) iii
متن کاملSurface acceleration during dry laser cleaning of silicon
We report on measurements of the surface acceleration for the application of dry laser cleaning. For that purpose, industrial silicon samples were irradiated by a frequency-doubled Q-switched Nd:YAG laser. The surface displacement was measured by a heterodyne interferometer and recorded by a digital storage oscilloscope. Several hundreds of shots were averaged to give smooth displacement curves...
متن کاملSurface Reconstruction of Etched Contours
Previously, a computationally efficient and geometrically accurate etching simulation was developed to compute contours of constant depth at different time steps [1]. Experimental verification of this early work has been established [2]. However, contours are not amenable to the analysis and design of microsystems, since it is often necessary to determine object interaction and mechanics in whi...
متن کاملAspect-ratio-dependent ultra-low reflection and luminescence of dry-etched Si nanopillars on Si substrate.
The Si nanopillars with high aspect ratio were fabricated by dry-etching the thin SiO(2)-covered Si substrate with a rapidly self-assembled Ni nanodot patterned mask. Aspect-ratio-dependent ultra-low reflection and anomalous luminescence of Si nanopillars are analyzed for applications in all-Si based lighting and energy transferring systems. The Si nanopillars induce an ultra-low reflectance an...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Journal of Applied Physics
سال: 2017
ISSN: 0021-8979,1089-7550
DOI: 10.1063/1.4993425